Invention Grant
- Patent Title: Photoacid generator, resist composition, and patterning process
- Patent Title (中): 光酸发生剂，抗蚀剂组合物和图案化工艺
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Application No.: US12204685Application Date: 2008-09-04
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Publication No.: US07670751B2Publication Date: 2010-03-02
- Inventor: Masaki Ohashi , Youichi Ohsawa , Takeru Watanabe , Takeshi Kinsho
- Applicant: Masaki Ohashi , Youichi Ohsawa , Takeru Watanabe , Takeshi Kinsho
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP.
- Priority: JP2007-230363 20070905
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/004
Abstract:
Photoacid generators generate sulfonic acids of formula (1a) or (1c) upon exposure to high-energy radiation. R1—COOCH(CF3)CF2SO3−H+ (1a) R1—O—COOCH(CF3)CF2SO3−H+ (1c) R1 is a C20-C50 hydrocarbon group having a steroid structure. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.
Public/Granted literature
- US20090061358A1 NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS Public/Granted day:2009-03-05
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