Invention Grant
- Patent Title: Photosensitive resin composition, composition for solder resist, and photosensitive dry film
- Patent Title (中): 感光树脂组合物,阻焊剂组合物和感光干膜
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Application No.: US11995111Application Date: 2006-07-27
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Publication No.: US07670752B2Publication Date: 2010-03-02
- Inventor: Makoto Hirakawa , Masao Takei , Hiroshi Niizuma
- Applicant: Makoto Hirakawa , Masao Takei , Hiroshi Niizuma
- Applicant Address: JP Tokyo
- Assignee: Toagosei Co., Ltd.
- Current Assignee: Toagosei Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2005-226020 20050803; JP2005-373645 20051227
- International Application: PCT/JP2006/314921 WO 20060727
- International Announcement: WO2007/015423 WO 20070208
- Main IPC: G03F7/033
- IPC: G03F7/033

Abstract:
A photosensitive resin composition which is excellent in storage stability required for one-part type compositions and in processability required for dry-film formation and gives a cured product suitable for FPC substrates or suspension substrates for hard-disc which each retains essential properties required for solder resists, such as heat resistance, water resistance, and electrical-insulation reliability, and has flexibility and low polluting property. The composition comprises: a compound which has a carbon-carbon double bond and carboxy group and is obtained by allowing a bisphenol type epoxy compound and an unsaturated monocarboxylic acid to react and then allowing a polybasic acid anhydride to undergo addition reaction with part or all of the secondary hydroxy groups of the reaction product; a urethane (meth)acrylate compound having a structure derived from a polycarbonate polyol structure; another polymerizable compound having a carbon-carbon double bond; and a photopolymerization initiator.
Public/Granted literature
- US20090068595A1 PHOTOSENSITIVE RESIN COMPOSITION, COMPOSITION FOR SOLDER RESIST, AND PHOTOSENSITIVE DRY FILM Public/Granted day:2009-03-12
Information query
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