Invention Grant
US07670757B2 Photosensitive resin composition, method of forming level difference pattern using the photosensitive resin composition, and method of producing ink jet head
失效
光敏树脂组合物，使用感光性树脂组合物形成水平差异图案的方法，以及制造喷墨头的方法
- Patent Title: Photosensitive resin composition, method of forming level difference pattern using the photosensitive resin composition, and method of producing ink jet head
- Patent Title (中): 光敏树脂组合物，使用感光性树脂组合物形成水平差异图案的方法，以及制造喷墨头的方法
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Application No.: US10577218Application Date: 2005-06-24
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Publication No.: US07670757B2Publication Date: 2010-03-02
- Inventor: Shoji Shiba , Hiroe Ishikura , Akihiko Okano
- Applicant: Shoji Shiba , Hiroe Ishikura , Akihiko Okano
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2004-190479 20040628
- International Application: PCT/JP2005/012161 WO 20050624
- International Announcement: WO2006/001516 WO 20060105
- Main IPC: G03F7/40
- IPC: G03F7/40 ; B41J1/135
Abstract:
To provide a positive type photosensitive resin composition, containing at least an acrylic resin having a carboxylic anhydride structure in a molecule, and a compound that generates an acid when irradiated with light.
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