Invention Grant
US07670869B2 Semiconductor device and fabrications thereof 有权
半导体器件及其制造

Semiconductor device and fabrications thereof
Abstract:
A memory device is disclosed. A pillar structure comprises a first electrode layer, a dielectric layer overlying the first electrode layer, and a second electrode layer overlying the dielectric layer. A phase change layer covers a surrounding of the pillar structure. A bottom electrode electrically connects the first electrode layer of the pillar structure. A top electrode electrically connects the second electrode layer of the pillar structure.
Public/Granted literature
Information query
Patent Agency Ranking
0/0