Invention Grant
- Patent Title: Method of fabricating a bottle trench and a bottle trench capacitor
- Patent Title (中): 制造瓶沟槽和瓶槽电容器的方法
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Application No.: US12033984Application Date: 2008-02-20
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Publication No.: US07670901B2Publication Date: 2010-03-02
- Inventor: Oh-Jung Kwon , Kenneth T. Settlemyer, Jr. , Ravikumar Ramachandran , Min-Soo Kim
- Applicant: Oh-Jung Kwon , Kenneth T. Settlemyer, Jr. , Ravikumar Ramachandran , Min-Soo Kim
- Applicant Address: US NY Armonk US CA San Jose DE Munich
- Assignee: International Business Machines Corporation,Infineon Technologies North America Corp.,Infineon Technologies AG
- Current Assignee: International Business Machines Corporation,Infineon Technologies North America Corp.,Infineon Technologies AG
- Current Assignee Address: US NY Armonk US CA San Jose DE Munich
- Agency: Schmeiser, Olsen & Watts
- Agent Steven Capella
- Main IPC: H01L21/762
- IPC: H01L21/762

Abstract:
A method of fabricating a bottle trench and a bottle trench capacitor. The method including: providing a substrate; forming a trench in the substrate, the trench having sidewalls and a bottom, the trench having an upper region adjacent to a top surface of the substrate and a lower region adjacent to the bottom of the trench; forming an oxidized layer of the substrate in the bottom region of the trench; and removing the oxidized layer of the substrate from the bottom region of the trench, a cross-sectional area of the lower region of the trench greater than a cross-sectional area of the upper region of the trench.
Public/Granted literature
- US20080242021A1 METHOD OF FABRICATING A BOTTLE TRENCH AND A BOTTLE TRENCH CAPACITOR Public/Granted day:2008-10-02
Information query
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