Invention Grant
US07670964B2 Apparatus and methods of forming a gas cluster ion beam using a low-pressure source
失效
使用低压源形成气体团簇离子束的装置和方法
- Patent Title: Apparatus and methods of forming a gas cluster ion beam using a low-pressure source
- Patent Title (中): 使用低压源形成气体团簇离子束的装置和方法
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Application No.: US11689572Application Date: 2007-03-22
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Publication No.: US07670964B2Publication Date: 2010-03-02
- Inventor: Scott Lane
- Applicant: Scott Lane
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Wood, Herron & Evans, LLP
- Main IPC: H01L21/31
- IPC: H01L21/31

Abstract:
Embodiments of a gas cluster ion beam apparatus and methods for forming a gas cluster ion beam using a low-pressure process source are generally described herein. In one embodiment, the low-pressure process source is mixed with a high-pressure diluent source in a static pump to form a mixed source, from which a gas cluster jet is generated and ionized to form the gas cluster ion beam. Other embodiments may be described and claimed.
Public/Granted literature
- US20080230714A1 APPARATUS AND METHODS OF FORMING A GAS CLUSTER ION BEAM USING A LOW-PRESSURE SOURCE Public/Granted day:2008-09-25
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