Invention Grant
- Patent Title: High strain-point glass composition for substrate
- Patent Title (中): 高应变点玻璃组合物
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Application No.: US11908782Application Date: 2006-06-21
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Publication No.: US07670976B2Publication Date: 2010-03-02
- Inventor: Jin Hyuk Lee , Si Moo Lee , Jae Wook Lee
- Applicant: Jin Hyuk Lee , Si Moo Lee , Jae Wook Lee
- Applicant Address: KR Seoul
- Assignee: KCC Corporation
- Current Assignee: KCC Corporation
- Current Assignee Address: KR Seoul
- Agency: Birch, Stewart, Kolasch & Birch LLP
- Priority: KR10-2005-0054044 20050622
- International Application: PCT/KR2006/002380 WO 20060621
- International Announcement: WO2006/137683 WO 20061228
- Main IPC: C03C3/078
- IPC: C03C3/078 ; C03C3/085 ; C03C3/087

Abstract:
The present invention relates to a glass substrate composition comprising SiO2 55˜70 wt %, Al2O3 0˜1 wt %, ZrO2 0.1˜5 wt %, Na2O 0.1˜5 wt %, K2O 7˜13 wt %, MgO 7˜14 wt %, CaO 0˜4 wt %, SrO 7˜12 wt % and SO3 0.01˜0.5 wt %. The glass substrate prepared by using the above composition shows less thermal deformation at a baking process under a high temperature since the strain point of the glass is at least 570° C., does not have such disadvantages as increase of fuel cost and short life cycle of refractories resulted from less than 1460° C. of melting point, and has 80˜95×10−7/° C. of thermal expansion coefficient in the temperature range of 50˜350° C. Therefore, the glass according to the present invention is suitable as a substrate.
Public/Granted literature
- US20080113857A1 High Strain-Point Glass Composition For Substrate Public/Granted day:2008-05-15
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