Invention Grant
- Patent Title: Composition and method for removing copper-compatible resist
- Patent Title (中): 去除铜兼容抗蚀剂的组成和方法
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Application No.: US11415266Application Date: 2006-05-02
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Publication No.: US07671002B2Publication Date: 2010-03-02
- Inventor: Gyoo-Chul Jo , Gee-Sung Chae , Oh-Nam Kwon , Kyoung-Mook Lee , Yong-Sup Hwang , Seong-Bae Kim , Suk-Chang Jang
- Applicant: Gyoo-Chul Jo , Gee-Sung Chae , Oh-Nam Kwon , Kyoung-Mook Lee , Yong-Sup Hwang , Seong-Bae Kim , Suk-Chang Jang
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge
- Main IPC: C11D7/32
- IPC: C11D7/32
Abstract:
A composition for removing a copper-compatible resist includes: about 0.1% to about 10% by weight of an alkylbenzenesulfonic compound; about 10% to about 99% by weight of a glycolether compound; and about 0.5% to about 5% by weight of a corrosion inhibitor.
Public/Granted literature
- US20060217278A1 Composition and method for removing copper-compatible resist Public/Granted day:2006-09-28
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