Invention Grant
- Patent Title: Electrically rewritable non-volatile memory element and method of manufacturing the same
- Patent Title (中): 电可重写非易失性存储元件及其制造方法
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Application No.: US11265275Application Date: 2005-11-03
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Publication No.: US07671356B2Publication Date: 2010-03-02
- Inventor: Isamu Asano , Tyler A. Lowrey
- Applicant: Isamu Asano , Tyler A. Lowrey
- Applicant Address: JP Tokyo
- Assignee: Elpida Memory, Inc.
- Current Assignee: Elpida Memory, Inc.
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Main IPC: H01L47/00
- IPC: H01L47/00

Abstract:
A non-volatile memory element comprising a bottom electrode 12, a top electrode 17 provided on the bottom electrode 12, and a recording layer 18 containing phase change material connected between the bottom electrode 12 and the top electrode 17. In accordance with this invention, the top electrode 17 is in contact with a growth initiation surface 18a of the recording layer 17. This structure can be obtained by forming the top electrode 17 before the recording layer 18, resulting in a three-dimensional structure. This decreases heat dissipation to the bit line without increasing the thickness of the recording layer 18.
Public/Granted literature
- US20070097738A1 Electrically rewritable non-volatile memory element and method of manufacturing the same Public/Granted day:2007-05-03
Information query
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