Invention Grant
- Patent Title: Lateral junction field effect transistor and method of manufacturing the same
- Patent Title (中): 横向场效应晶体管及其制造方法
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Application No.: US12179320Application Date: 2008-07-24
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Publication No.: US07671387B2Publication Date: 2010-03-02
- Inventor: Kazuhiro Fujikawa , Shin Harada , Kenichi Hirotsu , Satoshi Hatsukawa , Takashi Hoshino , Hiroyuki Matsunami , Tsunenobu Kimoto
- Applicant: Kazuhiro Fujikawa , Shin Harada , Kenichi Hirotsu , Satoshi Hatsukawa , Takashi Hoshino , Hiroyuki Matsunami , Tsunenobu Kimoto
- Applicant Address: JP Osaka
- Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee: Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka
- Agency: Fish & Richardson P.C.
- Priority: JP2002-071944 20020315
- Main IPC: H01L29/80
- IPC: H01L29/80

Abstract:
A lateral junction field effect transistor includes a first gate electrode layer arranged in a third semiconductor layer between source/drain region layers, having a lower surface extending on the second semiconductor layer, and doped with p-type impurities more heavily than the second semiconductor layer, and a second gate electrode layer arranged in a fifth semiconductor layer between the source/drain region layers, having a lower surface extending on a fourth semiconductor layer, having substantially the same concentration of p-type impurities as the first gate electrode layer, and having the same potential as the first gate electrode layer. Thereby, the lateral junction field effect transistor has a structure, which can reduce an on-resistance while maintaining good breakdown voltage properties.
Public/Granted literature
- US20080277696A1 Lateral Junction Field Effect Transistor and Method of Manufacturing The Same Public/Granted day:2008-11-13
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