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US07671437B2 Photogate stack with nitride insulating cap over conductive layer 有权
光栅叠层与导电层上的氮化物绝缘帽

Photogate stack with nitride insulating cap over conductive layer
Abstract:
A photogate structure having increased quantum efficiency, especially for low wavelength light such as blue light. The photogate is formed of a thin conductive layer, such as a layer of doped polysilicon. A nitride insulating cap is formed over the conductive layer. The nitride layer reduces the reflections at the conductor/insulator interface. A pixel cell incorporating the photogate structure also has a buried accumulation region beneath the photogate. A method of fabricating the photogate structure is also disclosed.
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