Invention Grant
- Patent Title: Photogate stack with nitride insulating cap over conductive layer
- Patent Title (中): 光栅叠层与导电层上的氮化物绝缘帽
-
Application No.: US11710987Application Date: 2007-02-27
-
Publication No.: US07671437B2Publication Date: 2010-03-02
- Inventor: Howard E. Rhodes
- Applicant: Howard E. Rhodes
- Applicant Address: KY Grand Cayman
- Assignee: Aptina Imaging Corporation
- Current Assignee: Aptina Imaging Corporation
- Current Assignee Address: KY Grand Cayman
- Agency: Dickstein Shapiro LLP
- Main IPC: H01L31/06
- IPC: H01L31/06

Abstract:
A photogate structure having increased quantum efficiency, especially for low wavelength light such as blue light. The photogate is formed of a thin conductive layer, such as a layer of doped polysilicon. A nitride insulating cap is formed over the conductive layer. The nitride layer reduces the reflections at the conductor/insulator interface. A pixel cell incorporating the photogate structure also has a buried accumulation region beneath the photogate. A method of fabricating the photogate structure is also disclosed.
Public/Granted literature
- US20070145512A1 Photogate stack with nitride insulating cap over conductive layer Public/Granted day:2007-06-28
Information query
IPC分类: