Invention Grant
- Patent Title: Semiconductor device including two organic semiconductor layers
- Patent Title (中): 半导体器件包括两个有机半导体层
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Application No.: US11376198Application Date: 2006-03-16
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Publication No.: US07671448B2Publication Date: 2010-03-02
- Inventor: Shinobu Furukawa , Ryota Imahayashi
- Applicant: Shinobu Furukawa , Ryota Imahayashi
- Applicant Address: JP Atsugi-shi, Kanagawa-Ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-Ken
- Agency: Nixon Peabody, LLP
- Agent Jeffrey L. Costellia
- Priority: JP2005-087133 20050324
- Main IPC: H01L35/24
- IPC: H01L35/24 ; H01L51/00 ; H01L29/04 ; H01L31/036 ; H01L31/153 ; H01L29/165

Abstract:
It is an object of the present invention to form an organic transistor including an organic semiconductor having high crystallinity without loosing an interface between an organic semiconductor of a channel where carriers are spread out and a gate insulating layer and deteriorating a yield. A semiconductor device according to the present invention has a stacked structure of organic semiconductor layers, and at least the upper organic semiconductor layer is in a polycrystalline or a single crystalline state and the lower organic semiconductor layer is made of a material serving as a channel. Carrier mobility can be increased owing to the upper organic semiconductor layer having high crystallinity; thus, insufficient contact due to the upper organic semiconductor layer can be compensated by the lower organic semiconductor layer.
Public/Granted literature
- US20060214160A1 Semiconductor device and manufacturing method thereof Public/Granted day:2006-09-28
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