Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US11132415Application Date: 2005-05-19
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Publication No.: US07671963B2Publication Date: 2010-03-02
- Inventor: Bob Streefkerk , Henrikus Herman Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes M Zaal , Minne Cuperus
- Applicant: Bob Streefkerk , Henrikus Herman Cox , Christiaan Alexander Hoogendam , Jeroen Johannes Sophia Maria Mertens , Koen Jacobus Johannes M Zaal , Minne Cuperus
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/32
Abstract:
An immersion lithographic apparatus includes a liquid supply system member configured to contain a liquid in a space between a projection system of the lithographic apparatus and the substrate and a liquid supply system member compensator arranged to compensate an interaction between the liquid supply system member and substrate table.
Public/Granted literature
- US20050270506A1 Lithographic apparatus and device manufacturing method Public/Granted day:2005-12-08
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