Invention Grant
US07671968B2 Lithographic apparatus having masking parts and device manufacturing method
有权
具有掩模部件和装置制造方法的平版印刷装置
- Patent Title: Lithographic apparatus having masking parts and device manufacturing method
- Patent Title (中): 具有掩模部件和装置制造方法的平版印刷装置
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Application No.: US11486378Application Date: 2006-07-14
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Publication No.: US07671968B2Publication Date: 2010-03-02
- Inventor: Erik Roelof Loopstra , Arno Jan Bleeker , Heine Melle Mulder , Oscar Franciscus Jozephus Noordman , Timotheus Franciscus Sengers , Laurentius Catrinus Jorritsma , Mark Trentelman , Gerrit Streutker
- Applicant: Erik Roelof Loopstra , Arno Jan Bleeker , Heine Melle Mulder , Oscar Franciscus Jozephus Noordman , Timotheus Franciscus Sengers , Laurentius Catrinus Jorritsma , Mark Trentelman , Gerrit Streutker
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/72
- IPC: G03B27/72
Abstract:
A lithographic apparatus includes a masking device that includes a first masking part configured to obscure a first part of a first patterning device before the pattern of the first patterning device is impinged by a radiation beam, a second masking part having an adjustable length, the second masking part configured to obscure a second part of the first patterning device after the pattern of the first patterning device is impinged by the radiation beam and to obscure a first part of a second patterning device before the pattern of the second patterning device is impinged by the radiation beam, and a third masking part configured to obscure a second part of the second patterning device after the pattern of the second patterning device is impinged by the radiation beam.
Public/Granted literature
- US20070013885A1 Stage apparatus, lithographic apparatus and device manufacturing method Public/Granted day:2007-01-18
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