Invention Grant
US07671970B2 Stage apparatus with two patterning devices, lithographic apparatus and device manufacturing method skipping an exposure field pitch
有权
具有两个图案形成装置的平台装置，光刻设备和跳过曝光场间距的装置制造方法
- Patent Title: Stage apparatus with two patterning devices, lithographic apparatus and device manufacturing method skipping an exposure field pitch
- Patent Title (中): 具有两个图案形成装置的平台装置，光刻设备和跳过曝光场间距的装置制造方法
-
Application No.: US11335715Application Date: 2006-01-20
-
Publication No.: US07671970B2Publication Date: 2010-03-02
- Inventor: Erik Roelof Loopstra
- Applicant: Erik Roelof Loopstra
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/62
- IPC: G03B27/62
Abstract:
In order to improve the productivity of a lithographic apparatus, a stage apparatus for holding two patterning devices is described. The patterning devices are arranged such that the distance between the patterns in the scanning direction corresponds to the length of the pattern in the scanning direction. By doing so, an improved exposure sequence may be performed by exposing a first die with a first pattern, skipping a second die adjacent to the first die, and exposing a third die adjacent to the second die using a second pattern.
Public/Granted literature
- US20070013894A1 Stage apparatus, lithographic apparatus and device manufacturing method Public/Granted day:2007-01-18
Information query
