Invention Grant
- Patent Title: Holographic fine-line pattern
- Patent Title (中): 全息细线图案
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Application No.: US10340852Application Date: 2003-01-10
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Publication No.: US07672030B2Publication Date: 2010-03-02
- Inventor: Mitsuru Kitamura
- Applicant: Mitsuru Kitamura
- Applicant Address: JP Tokyo
- Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2002-299757 20021015
- Main IPC: G03H1/00
- IPC: G03H1/00 ; G03H1/08 ; G03H1/26

Abstract:
The present invention relates to a three-dimensional security feature using a hologram which can not be counterfeited with color copying machines or diffraction grating image forming devices. The three-dimensional security feature comprises a hologram which is recorded in such a manner that it can be reconstructed to comprise at least two three-dimensional linear patterns when locally viewed, at least one of these two three-dimensional linear patterns having at least one portion which crosses the other linear pattern at the inner side and at least one portion which crosses the other linear pattern at the outer side.
Public/Granted literature
- US20040070800A1 Holographic fine-line Pattern Public/Granted day:2004-04-15
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