Invention Grant
US07672067B2 Optical device, exposure apparatus, and device manufacturing method
有权
光学装置，曝光装置和装置的制造方法
- Patent Title: Optical device, exposure apparatus, and device manufacturing method
- Patent Title (中): 光学装置，曝光装置和装置的制造方法
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Application No.: US12146571Application Date: 2008-06-26
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Publication No.: US07672067B2Publication Date: 2010-03-02
- Inventor: Kentarou Kawanami
- Applicant: Kentarou Kawanami
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. I.P. Division
- Priority: JP2007-171225 20070628
- Main IPC: G02B7/02
- IPC: G02B7/02
Abstract:
This invention effectively limits light incidence on an adhesive material fixing an optical element. An optical device includes an optical element, a supporting member connected to the optical element through an adhesive material to support the optical element, and a light shielding film formed in an unirradiated region on the surface of the optical element to limit light incidence on the adhesive material.
Public/Granted literature
- US20090002674A1 OPTICAL DEVICE, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2009-01-01
Information query
IPC分类:
| G | 物理 |
| G02 | 光学 |
| G02B | 光学元件、系统或仪器 |
| G02B7/00 | 光学元件的安装、调整装置或不漏光连接 |
| G02B7/02 | .用于透镜 |
