Invention Grant
- Patent Title: Pole width control on plated bevel main pole design of a perpendicular magnetic recording head
- Patent Title (中): 极板宽度控制电镀斜面主极设计的垂直磁记录头
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Application No.: US10886284Application Date: 2004-07-07
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Publication No.: US07672079B2Publication Date: 2010-03-02
- Inventor: Donghong Li , Yoshitaka Sasaki
- Applicant: Donghong Li , Yoshitaka Sasaki
- Applicant Address: US CA Milpitas
- Assignee: Headway Technologies, Inc.
- Current Assignee: Headway Technologies, Inc.
- Current Assignee Address: US CA Milpitas
- Agency: Saile Ackerman LLC
- Agent Stephen B. Ackerman
- Main IPC: G11B5/127
- IPC: G11B5/127

Abstract:
A main pole layer is deposited within an opening in a patterned photoresist layer on a substrate. The photoresist is thinned to expose an upper portion of a pole tip region that is then trimmed to a rectangular shape while a lower portion retains an inverted trapezoidal shape. Thereafter, a second trimming process forms a pole tip with a first width in the upper rectangular portion and a second thickness and second width which is less than the first width in the lower portion. A CMP step subsequently thins the upper portion to a first thickness of 0.04 to 0.08 microns while the second thickness remains at 0.16 to 0.32 microns. The bottom surface of the lower portion along the ABS becomes the trailing edge in a recording operation. The pole tip has a consistent first width (track width) that is not influenced by CMP process variations.
Public/Granted literature
- US20060044677A1 Pole width control on plated bevel main pole design of a perpendicular magnetic recording head Public/Granted day:2006-03-02
Information query
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