Invention Grant
- Patent Title: Electrostatic chuck and method for manufacturing same
- Patent Title (中): 静电吸盘及其制造方法
-
Application No.: US11998463Application Date: 2007-11-29
-
Publication No.: US07672111B2Publication Date: 2010-03-02
- Inventor: Jun Miyaji , Ikuo Itakura , Shoichiro Himuro
- Applicant: Jun Miyaji , Ikuo Itakura , Shoichiro Himuro
- Applicant Address: JP Fukuoka
- Assignee: Toto Ltd.
- Current Assignee: Toto Ltd.
- Current Assignee Address: JP Fukuoka
- Agency: Carrier, Blackman & Associates, P.C.
- Agent Joseph P. Carrier; William D. Blackman
- Main IPC: H02N13/00
- IPC: H02N13/00 ; H02H1/00

Abstract:
An electrostatic chuck includes: a metal plate with an insulator film formed on a surface thereof by thermal spraying; and a dielectric substrate with an electrode formed on a surface thereof. The metal plate and the dielectric substrate are bonded together via an insulative adhesive interposed therebetween so that the insulator film is opposed to the electrode, and the insulator film has a thickness of 0.6 mm or less. Alternatively, An electrostatic chuck includes: a metal plate with an insulator film formed on a surface thereof by thermal spraying; and a dielectric substrate with an electrode selectively formed on a surface thereof. The metal plate and the dielectric substrate are bonded together via an insulative adhesive interposed therebetween so that the insulator film is opposed to the electrode. The insulative adhesive is interposed also between the insulator film and a portion of the surface of the dielectric substrate where the electrode is not formed, and the insulative adhesive has a thermal conductivity of 1 W/mK or more.
Public/Granted literature
- US20080212255A1 Electrostatic chuck and method for manufacturing same Public/Granted day:2008-09-04
Information query