Invention Grant
US07673258B2 Design data creating method, design data creating program product, and manufacturing method of semiconductor device
失效
设计数据创建方法，设计数据创建程序产品和半导体器件的制造方法
- Patent Title: Design data creating method, design data creating program product, and manufacturing method of semiconductor device
- Patent Title (中): 设计数据创建方法，设计数据创建程序产品和半导体器件的制造方法
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Application No.: US11727963Application Date: 2007-03-29
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Publication No.: US07673258B2Publication Date: 2010-03-02
- Inventor: Suigen Kyoh
- Applicant: Suigen Kyoh
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2006-099717 20060331
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06F19/00
Abstract:
According to an aspect of the invention, there is provided a design data creating method of creating design data of a semiconductor device including extracting an AND region of an upper layer wiring pattern and a lower layer wiring pattern that sandwich a contact hole layer pattern included in a pattern layer, extracting the contact hole layer pattern included in the AND region, and moving the contact hole layer pattern in such a manner that the center of the AND region coincides with the center of the contact hole layer pattern.
Public/Granted literature
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