Invention Grant
US07673637B2 Photomask cleaner 有权
光掩模清洁剂

  • Patent Title: Photomask cleaner
  • Patent Title (中): 光掩模清洁剂
  • Application No.: US11889376
    Application Date: 2007-08-13
  • Publication No.: US07673637B2
    Publication Date: 2010-03-09
  • Inventor: Yung-Shun Pan
  • Applicant: Yung-Shun Pan
  • Agency: Sinorica, LLC
  • Agent Ming Chow
  • Priority: TW95129999A 20060815
  • Main IPC: B08B3/02
  • IPC: B08B3/02
Photomask cleaner
Abstract:
A photomask cleaner includes a clamp assembly using clamping plates with an elastic buffer device for clamping a photomask to be cleaned positively, a displacement mechanism for moving the clamp assembly among workstations subject to a predetermined track, a cleaning unit installed in one workstation for cleaning the photomask carried by the clamp assembly, and an air dryer installed in one workstation for drying the well-cleaned photomask carried.
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