Invention Grant
- Patent Title: Photomask cleaner
- Patent Title (中): 光掩模清洁剂
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Application No.: US11889376Application Date: 2007-08-13
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Publication No.: US07673637B2Publication Date: 2010-03-09
- Inventor: Yung-Shun Pan
- Applicant: Yung-Shun Pan
- Agency: Sinorica, LLC
- Agent Ming Chow
- Priority: TW95129999A 20060815
- Main IPC: B08B3/02
- IPC: B08B3/02

Abstract:
A photomask cleaner includes a clamp assembly using clamping plates with an elastic buffer device for clamping a photomask to be cleaned positively, a displacement mechanism for moving the clamp assembly among workstations subject to a predetermined track, a cleaning unit installed in one workstation for cleaning the photomask carried by the clamp assembly, and an air dryer installed in one workstation for drying the well-cleaned photomask carried.
Public/Granted literature
- US20080041429A1 Photomask cleaner Public/Granted day:2008-02-21
Information query
IPC分类: