Invention Grant
- Patent Title: Method of producing a thin conductive metal film
- Patent Title (中): 薄导电金属薄膜的制造方法
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Application No.: US10497602Application Date: 2002-12-16
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Publication No.: US07674401B2Publication Date: 2010-03-09
- Inventor: Mutsuhiro Maruyama
- Applicant: Mutsuhiro Maruyama
- Applicant Address: JP Osaka
- Assignee: Asahi Kasei Kabushiki Kaisha
- Current Assignee: Asahi Kasei Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Birch, Stewart, Kolasch $ Birch, LLP.
- Priority: JP2001-384573 20011218; JP2002-098604 20020401
- International Application: PCT/JP02/13141 WO 20021216
- International Announcement: WO03/051562 WO 20030626
- Main IPC: H01B1/00
- IPC: H01B1/00
Abstract:
The present invention relates to a metal oxide dispersion, which can form a metal thin film onto a substrate by heat treatment at a low temperature, wherein a metal oxide having a particle diameter of less than 200 nm is dispersed in the dispersion medium. By heat treating the dispersion after applying it onto a substrate, a metal thin film is formed.
Public/Granted literature
- US20050069648A1 Metal oxide dispersion Public/Granted day:2005-03-31
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