Invention Grant
- Patent Title: Process for producing a nanoscale zero-valent metal
- Patent Title (中): 制备纳米级零价金属的方法
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Application No.: US11289939Application Date: 2005-11-29
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Publication No.: US07674526B2Publication Date: 2010-03-09
- Inventor: Andrew Feitz , Jing Guan , David Waite
- Applicant: Andrew Feitz , Jing Guan , David Waite
- Applicant Address: AU Eveleigh, New South Wales
- Assignee: CRC for Waste Management and Pollution Control, Limited
- Current Assignee: CRC for Waste Management and Pollution Control, Limited
- Current Assignee Address: AU Eveleigh, New South Wales
- Agency: TechLaw LLP
- Agent David W. Maher
- Priority: AU2003902704 20030529
- Main IPC: B32B5/16
- IPC: B32B5/16

Abstract:
This invention describes a process for producing a nanoscale zero-valent metal, including reduction of a metal ion solution with a dithionite compound, wherein the reduction is carried out under alkaline conditions under substantially an inert atmosphere. A nanoscale zero-valent metal obtainable by this process, and having a new crystalline form, is also described. The nanoscale zero-valent metal produced by the process of the invention is preferably iron, and is advantageously used for the remediation of contaminated water.
Public/Granted literature
- US20060083924A1 Process for producing a nanoscale zero-valent metal Public/Granted day:2006-04-20
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