Invention Grant
US07674572B2 Exposure mask pattern for LCD and exposure method using the same
有权
用于LCD的曝光掩模图案和使用它的曝光方法
- Patent Title: Exposure mask pattern for LCD and exposure method using the same
- Patent Title (中): 用于LCD的曝光掩模图案和使用它的曝光方法
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Application No.: US11170849Application Date: 2005-06-29
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Publication No.: US07674572B2Publication Date: 2010-03-09
- Inventor: Kwang Hoon Shin , Hyun Suk Jin , Ho Jin Ryu , Won Seok Kang , Deuk Su Lee
- Applicant: Kwang Hoon Shin , Hyun Suk Jin , Ho Jin Ryu , Won Seok Kang , Deuk Su Lee
- Applicant Address: KR Seoul
- Assignee: LG. Display Co., Ltd.
- Current Assignee: LG. Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Brinks Hofer Gilson & Lione
- Priority: KR10-2004-0072883 20040913
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02F1/13
Abstract:
An exposure method for an LCD is provided. In the method, a sub-pixel region of an array substrate is divided into a first exposure region and a second exposure region, and the first exposure region and the second exposure region are sequentially exposed.
Public/Granted literature
- US20060057788A1 Exposure mask pattern for LCD and exposure method using the same Public/Granted day:2006-03-16
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