Invention Grant
- Patent Title: Method for manufacturing layered periodic structures
- Patent Title (中): 层状周期性结构的制造方法
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Application No.: US11500321Application Date: 2006-08-08
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Publication No.: US07674573B2Publication Date: 2010-03-09
- Inventor: Mamoru Miyawaki , Jiang-Rong Cao
- Applicant: Mamoru Miyawaki , Jiang-Rong Cao
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Main IPC: H01L21/00
- IPC: H01L21/00 ; G02B6/10

Abstract:
A method of manufacturing a periodic grating structure for a component. The method includes forming first structured layer including a final periodic grating structure of a first material and a second material filling spaces between individual features of the final periodic grating structure, removing the second material using a first chemical process and annealing a portion of the first material into a third material using a second chemical process.
Public/Granted literature
- US20080038852A1 Method for manufacturing layered periodic structures Public/Granted day:2008-02-14
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