Invention Grant
- Patent Title: Method for manufacturing photoelectric conversion device
- Patent Title (中): 制造光电转换装置的方法
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Application No.: US12277361Application Date: 2008-11-25
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Publication No.: US07674647B2Publication Date: 2010-03-09
- Inventor: Yasuyuki Arai
- Applicant: Yasuyuki Arai
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2007-309770 20071130
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for manufacturing a photoelectric conversion device typified by a solar cell, having an excellent photoelectric conversion characteristic with a silicon semiconductor material effectively utilized. The point is that the surface of a single crystal semiconductor layer bonded to a supporting substrate is irradiated with a pulsed laser beam to become rough. The single crystal semiconductor layer is irradiated with the pulsed laser beam in an atmosphere containing an inert gas and oxygen so that the surface thereof is made rough. With the roughness of surface of the single crystal semiconductor layer, light reflection is suppressed so that incident light can be trapped. Accordingly, even when the thickness of the single crystal semiconductor layer is equal to or greater than 0.1 μm and equal to or less than 10 μm, path length of incident light is substantially increased so that the amount of light absorption can be increased.
Public/Granted literature
- US20090142874A1 METHOD FOR MANUFACTURING PHOTOELECTRIC CONVERSION DEVICE Public/Granted day:2009-06-04
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