Invention Grant
US07674675B2 Method of forming an integrated SOI fingered decoupling capacitor
失效
形成集成的SOI手指去耦电容器的方法
- Patent Title: Method of forming an integrated SOI fingered decoupling capacitor
- Patent Title (中): 形成集成的SOI手指去耦电容器的方法
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Application No.: US11485599Application Date: 2006-07-12
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Publication No.: US07674675B2Publication Date: 2010-03-09
- Inventor: Zachary E. Berndlmaier , Edward W. Kiewra , Carl J. Radens , William R. Tonti
- Applicant: Zachary E. Berndlmaier , Edward W. Kiewra , Carl J. Radens , William R. Tonti
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Gibb I.P. Law Firm, LLC
- Agent Steven Capella, Esq.
- Main IPC: H01L21/8242
- IPC: H01L21/8242

Abstract:
The invention provides a fingered decoupling capacitor in the bulk silicon region that are formed by etching a series of minimum or sub-minimum trenches in the bulk silicon region, oxidizing these trenches, removing the oxide from at least one or more disjoint trenches, filling all the trenches with either in-situ doped polysilicon, intrinsic polysilicon that is later doped through ion implantation, or filling with a metal stud, such as tungsten and forming standard interconnects to the capacitor plates.
Public/Granted literature
- US20060252226A1 Integrated SOI fingered decoupling capacitor Public/Granted day:2006-11-09
Information query
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