Invention Grant
- Patent Title: Sawing method for a semiconductor element with a microelectromechanical system
- Patent Title (中): 具有微机电系统的半导体元件的锯切方法
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Application No.: US12051896Application Date: 2008-03-20
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Publication No.: US07674688B2Publication Date: 2010-03-09
- Inventor: Wei-Min Hsiao
- Applicant: Wei-Min Hsiao
- Applicant Address: TW Kaohsiung
- Assignee: Advanced Semiconductor Engineering, Inc.
- Current Assignee: Advanced Semiconductor Engineering, Inc.
- Current Assignee Address: TW Kaohsiung
- Agency: Volentine & Whitt, P.L.L.C.
- Priority: TW96129740A 20070810
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A sawing method for a Micro Electro-Mechanical Systems (MEMS) semiconductor device, wherein a gum material is disposed between a wafer having at least one MEMS and a carrier, and the gum material is disposed around the MEMS. The wafer is sawed according to the position correspondingly above the gum material. Finally, the carrier and the gum material are removed. By disposing the gum material between the carrier and the wafer, the MEMS are protected, and the wafer and the MEMS can avoid the pollution of water and foreign material, so that the yield can be improved. Furthermore, the wafer is sawed from the backside till the gum material without sawing through the gum material, so that the carrier is not sawed. Therefore, the carrier can be reused, such that the cost is reduced.
Public/Granted literature
- US20090042367A1 SAWING METHOD FOR A SEMICONDUCTOR ELEMENT WITH A MICROELECTROMECHANICAL SYSTEM Public/Granted day:2009-02-12
Information query
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