Invention Grant
US07674688B2 Sawing method for a semiconductor element with a microelectromechanical system 有权
具有微机电系统的半导体元件的锯切方法

Sawing method for a semiconductor element with a microelectromechanical system
Abstract:
A sawing method for a Micro Electro-Mechanical Systems (MEMS) semiconductor device, wherein a gum material is disposed between a wafer having at least one MEMS and a carrier, and the gum material is disposed around the MEMS. The wafer is sawed according to the position correspondingly above the gum material. Finally, the carrier and the gum material are removed. By disposing the gum material between the carrier and the wafer, the MEMS are protected, and the wafer and the MEMS can avoid the pollution of water and foreign material, so that the yield can be improved. Furthermore, the wafer is sawed from the backside till the gum material without sawing through the gum material, so that the carrier is not sawed. Therefore, the carrier can be reused, such that the cost is reduced.
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