Invention Grant
- Patent Title: Via hole machining for microwave monolithic integrated circuits
- Patent Title (中): 微波单片集成电路的通孔加工
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Application No.: US11194419Application Date: 2005-08-01
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Publication No.: US07674719B2Publication Date: 2010-03-09
- Inventor: Ming Li , Xinbing Liu , Hiroyuki Sakai , Masaaki Nishijima , Daisuke Ueda
- Applicant: Ming Li , Xinbing Liu , Hiroyuki Sakai , Masaaki Nishijima , Daisuke Ueda
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: RatnerPrestia
- Main IPC: H01L21/302
- IPC: H01L21/302

Abstract:
A method for forming a via in a sapphire substrate with a laser machining system that includes an ultrafast pulsed laser source. The sapphire substrate is provided. Pulses of laser light are substantially focused to a beam spot on the first surface of the sapphire substrate such that each focused pulse of laser light ablates a volume of the sapphire substrate having a depth less than the substrate thickness. The beam spot of the focused laser light pulses is scanned over a via portion of the first surface of the sapphire substrate. The sapphire substrate is moved in a direction substantially normal to the first surface to control the volume of the sapphire substrate ablated by each pulse of laser light to be substantially constant. The pulsing and scanning steps are repeated until the via is formed extending from the first surface to the second surface of the sapphire substrate.
Public/Granted literature
- US20070026676A1 Via hole machining for microwave monolithic integrated circuits Public/Granted day:2007-02-01
Information query
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