Invention Grant
US07675048B2 Wafer holding robot end effecter vertical position determination in ion implanter system
有权
离子注入机系统中晶圆保持机器人末端执行器垂直位置确定
- Patent Title: Wafer holding robot end effecter vertical position determination in ion implanter system
- Patent Title (中): 离子注入机系统中晶圆保持机器人末端执行器垂直位置确定
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Application No.: US11682458Application Date: 2007-03-06
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Publication No.: US07675048B2Publication Date: 2010-03-09
- Inventor: Brant S. Binns , Kevin Daniels , Robert A. Poltras
- Applicant: Brant S. Binns , Kevin Daniels , Robert A. Poltras
- Applicant Address: US MA Gloucester
- Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee: Varian Semiconductor Equipment Associates, Inc.
- Current Assignee Address: US MA Gloucester
- Main IPC: H01J37/20
- IPC: H01J37/20 ; H01J37/317
Abstract:
A wafer handling robot, ion implanter system including a wafer handling robot and a related method are disclosed. An ion implanter system may include an ion implanting station including a load lock coupled thereto; a wafer handling robot located at least partially within the load lock, the wafer handling robot including an end effecter for handling at least one wafer, and a motor for moving the end effecter vertically; and a sensor positioned within the load lock to determine a vertical position of the end effecter.
Public/Granted literature
- US20080218772A1 WAFER HOLDING ROBOT END EFFECTER VERTICAL POSITION DETERMINATION IN ION IMPLANTER SYSTEM Public/Granted day:2008-09-11
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