Invention Grant
US07675083B2 Oxynitride-based fluorescent material and method for production thereof 失效
基于氮氧化物的荧光材料及其制造方法

  • Patent Title: Oxynitride-based fluorescent material and method for production thereof
  • Patent Title (中): 基于氮氧化物的荧光材料及其制造方法
  • Application No.: US11663820
    Application Date: 2005-09-28
  • Publication No.: US07675083B2
    Publication Date: 2010-03-09
  • Inventor: Kousuke Shioi
  • Applicant: Kousuke Shioi
  • Applicant Address: JP Tokyo
  • Assignee: Showa Denko K.K.
  • Current Assignee: Showa Denko K.K.
  • Current Assignee Address: JP Tokyo
  • Agency: Sughrue Mion, PLLC
  • Priority: JP2004-284018 20040929
  • International Application: PCT/JP2005/018385 WO 20050928
  • International Announcement: WO2006/035991 WO 20060604
  • Main IPC: H01L33/00
  • IPC: H01L33/00
Oxynitride-based fluorescent material and method for production thereof
Abstract:
An oxynitride-based fluorescent material is formed of what results from substituting Eu for part of M of a general formula M3Si2N2O4, wherein M denotes one or more elements selected from among Be, Mg, Ca, Sr and Ba. The oxynitride-based fluorescent material can be produced by a method comprising mixing an oxide of Be, Mg, Ca, Sr, Ba or Eu, or a compound of Be, Mg, Ca, Sr, Ba or Eu enabled by heating to form an oxide, silicon nitride or a compound enabled by heating to form silicon nitride, and silicon oxide or a compound enabled by heating to form silicon oxide to obtain a mixture and firing the mixture in a vacuum or a non-oxidizing atmosphere at 1200 to 1900° C.
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