Invention Grant
- Patent Title: Lithographic apparatus and method
- Patent Title (中): 平版印刷设备和方法
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Application No.: US11418453Application Date: 2006-05-05
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Publication No.: US07675606B2Publication Date: 2010-03-09
- Inventor: Enno Van Den Brink , Henricus Wilhelmus Maria Van Buel , Joseph Consolini , Gerardus Johannes Joseph Keijsers , Klaus Simon , Johannes Theodoor De Smit , Richard Joseph Travers , Maurice Anton Jaques Teuwen , Arnout Johannes Meester , Frederick William Hafner , Vinyu Greenlee , Hubertus Antonius Marinus Baijens
- Applicant: Enno Van Den Brink , Henricus Wilhelmus Maria Van Buel , Joseph Consolini , Gerardus Johannes Joseph Keijsers , Klaus Simon , Johannes Theodoor De Smit , Richard Joseph Travers , Maurice Anton Jaques Teuwen , Arnout Johannes Meester , Frederick William Hafner , Vinyu Greenlee , Hubertus Antonius Marinus Baijens
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03B27/42
Abstract:
According to one of the aspects of the present invention there is provided a substrate carrier arranged to hold a substrate in position using a vacuum, the vacuum being established in a sealed space created between the substrate carrier and the substrate.
Public/Granted literature
- US20070258080A1 Lithographic apparatus and method Public/Granted day:2007-11-08
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