A lithographic apparatus is disclosed having a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, the support including a support clamp constructed to clamp the patterning device to the support, and a bending mechanism constructed to apply a bending torque to the clamped patterning device, the bending mechanism comprising a force/torque actuator configured to act on the clamped patterning device without substantially reducing the clamping force exerted on the patterning device by the support clamp.