Invention Grant
- Patent Title: Imprint lithography
- Patent Title (中): 印刷光刻
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Application No.: US11019521Application Date: 2004-12-23
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Publication No.: US07676088B2Publication Date: 2010-03-09
- Inventor: Klaus Simon
- Applicant: Klaus Simon
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G06K9/00
- IPC: G06K9/00 ; B41F33/00 ; G03B27/58
Abstract:
An imprinting method is disclosed that, in embodiment, includes contacting first and second spaced target regions of an imprintable medium on a substrate with first and second templates respectively to form respective first and second imprints in the medium and separating the first and second templates from the imprinted medium.
Public/Granted literature
- US20060137555A1 Imprint lithography Public/Granted day:2006-06-29
Information query
