Invention Grant
US07676904B2 Method of manufacturing high sensitivity spin valve designs with ion beam treatment
失效
用离子束处理制造高灵敏度自旋阀设计的方法
- Patent Title: Method of manufacturing high sensitivity spin valve designs with ion beam treatment
- Patent Title (中): 用离子束处理制造高灵敏度自旋阀设计的方法
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Application No.: US10903097Application Date: 2004-07-30
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Publication No.: US07676904B2Publication Date: 2010-03-16
- Inventor: Phong V. Chau , James Mac Freitag , Mustafa Michael Pinarbasi , Hua Ai Zeng
- Applicant: Phong V. Chau , James Mac Freitag , Mustafa Michael Pinarbasi , Hua Ai Zeng
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee: Hitachi Global Storage Technologies Netherlands B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Zilka-Kotab, PC
- Main IPC: G11B5/127
- IPC: G11B5/127 ; C23C14/34
Abstract:
A method of manufacturing a GMR, TMR or CPP GMR sensor having a smooth interface between magnetic and non-magnetic layers to improve sensor performance by exposing a layer to a low energy ion beam prior to depositing a subsequent layer.
Public/Granted literature
- US20060023371A1 High sensitivity spin valve designs with ion beam treatment Public/Granted day:2006-02-02
Information query
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