Invention Grant
- Patent Title: Retaining ring with flange for chemical mechanical polishing
- Patent Title (中): 带法兰的挡圈用于化学机械抛光
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Application No.: US11506477Application Date: 2006-08-17
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Publication No.: US07677958B2Publication Date: 2010-03-16
- Inventor: Dan A. Marohl , Ming-Kuei Tseng
- Applicant: Dan A. Marohl , Ming-Kuei Tseng
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: B24B47/26
- IPC: B24B47/26
Abstract:
A retaining ring has a generally annular body with a top surface, a bottom surface, an inner diameter surface, and an outer diameter surface. The outer diameter surface includes an outwardly projecting flange having a lower surface, and the bottom surface includes a plurality of channels.
Public/Granted literature
- US20060281395A1 Retaining ring with flange for chemical mechanical polishing Public/Granted day:2006-12-14
Information query
