Invention Grant
- Patent Title: Multilayer polishing pad and method of making
- Patent Title (中): 多层抛光垫及其制作方法
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Application No.: US11375480Application Date: 2006-03-13
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Publication No.: US07677959B2Publication Date: 2010-03-16
- Inventor: Robert D. Tolles
- Applicant: Robert D. Tolles
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson
- Main IPC: B24D11/00
- IPC: B24D11/00
Abstract:
A polishing pad has a polishing layer with a polishing surface and a first registration mark, and a backing layer connected to the polishing layer and having a second registration mark aligned with the first registration mark. The polishing pad may have a window that includes an aperture in the backing layer aligned with a solid transparent portion in the polishing layer.
Public/Granted literature
- US20060154568A1 Multilayer polishing pad and method of making Public/Granted day:2006-07-13
Information query
