Invention Grant
- Patent Title: Gas diffusion substrate and electrode
- Patent Title (中): 气体扩散基板和电极
-
Application No.: US11970334Application Date: 2008-01-07
-
Publication No.: US07678162B2Publication Date: 2010-03-16
- Inventor: Susan Joy Cooper , Graham Alan Hards , Gregor Hoogers , Sarah Caroline Ball , David Thompsett
- Applicant: Susan Joy Cooper , Graham Alan Hards , Gregor Hoogers , Sarah Caroline Ball , David Thompsett
- Applicant Address: GB London
- Assignee: Johnson Matthey Public Limited Company
- Current Assignee: Johnson Matthey Public Limited Company
- Current Assignee Address: GB London
- Agency: RatnerPrestia
- Priority: GB9914023.8 19990617
- Main IPC: H01M4/82
- IPC: H01M4/82 ; H01M6/00 ; H01M4/00

Abstract:
An electrically conducting gas diffusion substrate, capable of removing oxidisable impurities from an impure gas stream, which comprises an electrically conducting porous structure and a first catalytic component, wherein the first catalytic component comprises a first catalyst supported on an electrically non-conducting support is disclosed. In addition, an electrode, a membrane electrode assembly and a fuel cell each comprising said electrically conducting gas diffusion substrate is disclosed.
Public/Granted literature
- US20080187817A1 GAS DIFFUSION SUBSTRATE AND ELECTRODE Public/Granted day:2008-08-07
Information query