Invention Grant
- Patent Title: Electroless palladium plating bath and electroless palladium plating method
- Patent Title (中): 无电镀钯浴和无电镀钯法
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Application No.: US12067662Application Date: 2006-09-22
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Publication No.: US07678183B2Publication Date: 2010-03-16
- Inventor: Akihiko Murasumi , Seigo Kurosaka , Hiromu Inagawa , Yukinori Oda
- Applicant: Akihiko Murasumi , Seigo Kurosaka , Hiromu Inagawa , Yukinori Oda
- Applicant Address: JP Osaka-shi
- Assignee: C. Uyemura & Co., Ltd.
- Current Assignee: C. Uyemura & Co., Ltd.
- Current Assignee Address: JP Osaka-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2005-279180 20050927
- International Application: PCT/JP2006/318827 WO 20060922
- International Announcement: WO2007/037176 WO 20070405
- Main IPC: C23C18/44
- IPC: C23C18/44

Abstract:
Disclosed is an electroless palladium plating bath containing a palladium compound, at least one complexing agent selected from ammonia and amine compounds, at least one reducing agent selected from phosphinic acid and phosphinates, and at least one unsaturated carboxylic acid compound selected from unsaturated carboxylic acids, unsaturated carboxylic acid anhydrides, unsaturated carboxylates and unsaturated carboxylic acid derivatives. Such an electroless palladium plating bath has high bath stability, and decomposition of the bath hardly occurs. Consequently, the electroless palladium plating bath of the present invention has a longer bath life than conventional electroless palladium plating baths. In addition, this electroless palladium plating bath enables to obtain excellent solder bonding characteristics and wire bonding characteristics since it does not affect plating film characteristics even when it is used for a long time.
Public/Granted literature
- US20090133603A1 ELECTROLESS PALLADIUM PLATING BATH AND ELECTROLESS PALLADIUM PLATING METHOD Public/Granted day:2009-05-28
Information query
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