Invention Grant
- Patent Title: Method for providing gas to a processing chamber
- Patent Title (中): 向处理室提供气体的方法
-
Application No.: US11563830Application Date: 2006-11-28
-
Publication No.: US07678194B2Publication Date: 2010-03-16
- Inventor: Seshadri Ganguli , Ling Chen , Vincent W. Ku
- Applicant: Seshadri Ganguli , Ling Chen , Vincent W. Ku
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: C30B21/04
- IPC: C30B21/04
Abstract:
A method and apparatus for generating gas for a processing system is provided. In one embodiment, an apparatus for generating gas for a processing system includes a canister having at least one baffle disposed between two ports and containing a precursor material. The precursor material is adapted to produce a gas vapor when heated to a defined temperature at a defined pressure. The baffle forces a carrier gas to travel an extended mean path between the inlet and outlet ports. In another embodiment, an apparatus for generating gas includes a canister having a tube that directs a carrier gas flowing into the canister away from a precursor material disposed within the canister.
Public/Granted literature
- US20070089817A1 METHOD FOR PROVIDING GAS TO A PROCESSING CHAMBER Public/Granted day:2007-04-26
Information query
