Invention Grant
- Patent Title: Method for controlling plasma density or the distribution thereof
- Patent Title (中): 用于控制血浆密度或其分布的方法
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Application No.: US12053299Application Date: 2008-03-21
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Publication No.: US07678240B2Publication Date: 2010-03-16
- Inventor: Siegfried Krassnitzer
- Applicant: Siegfried Krassnitzer
- Applicant Address: LI Balzers
- Assignee: OC Oerlikon Balzers AG
- Current Assignee: OC Oerlikon Balzers AG
- Current Assignee Address: LI Balzers
- Agency: Nataro & Michalos P.C.
- Priority: CH351/00 20000223
- Main IPC: C23C14/35
- IPC: C23C14/35

Abstract:
Magnetron source has a target configuration with a sputter surface, a magnet configuration generating above the sputter surface a magnetic field which forms, in top view onto the sputter surface, at least one magnet field loop. Viewed in a cross-sectional direction upon the target configuration, a tunnel-shaped arc magnet field is formed and further an electrode configuration is provided which generates, when supplied by a positive electric potential with respect to an electric potential applied to the target configuration, an electric field which crosses at an angle the magnetic field and wherein the electrode configuration comprises a distinct electrode arrangement in a limited segment area of the electrode configuration, which is substantially shorter than the overall length of the magnet field loop. The electrode arrangement along the limited segment area is electrically isolated from the remainder of the electrode configuration so as to be electrically operated differently than the remainder of the electrode configuration.
Public/Granted literature
- US20080210548A1 Method for Controlling Plasma Density or the Distribution Thereof Public/Granted day:2008-09-04
Information query
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