Invention Grant
US07678255B2 Mask and method for electrokinetic deposition and patterning process on substrates
有权
用于基体上的电动沉积和图案化工艺的掩模和方法
- Patent Title: Mask and method for electrokinetic deposition and patterning process on substrates
- Patent Title (中): 用于基体上的电动沉积和图案化工艺的掩模和方法
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Application No.: US11419128Application Date: 2006-05-18
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Publication No.: US07678255B2Publication Date: 2010-03-16
- Inventor: Oscar Khaselev , Brian G. Lewis , Michael Marczi , Bawa Singh
- Applicant: Oscar Khaselev , Brian G. Lewis , Michael Marczi , Bawa Singh
- Applicant Address: US NJ Jersey City
- Assignee: Fry's Metals, Inc.
- Current Assignee: Fry's Metals, Inc.
- Current Assignee Address: US NJ Jersey City
- Agency: Senniger Powers LLP
- Main IPC: C25D13/12
- IPC: C25D13/12 ; G03G13/32

Abstract:
A mask for application to a substrate to facilitate electrokinetic deposition of charged particles onto the substrate, the mask comprising a conducting layer, a dielectric layer, and mask openings. A method for applying a pattern of charged particles to a substrate comprising applying the foregoing the substrate to yield a masked substrate; immersing the masked substrate in a bath containing the charged particles; and establishing an electrical potential between the conducting layer of the mask and a counter-electrode thereby electrokinetically depositing the particles through the mask openings onto areas of the substrate exposed in the mask openings. Products made by this method.
Public/Granted literature
- US20060260943A1 MASK AND METHOD FOR ELECTROKINETIC DEPOSITION AND PATTERNING PROCESS ON SUBSTRATES Public/Granted day:2006-11-23
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