Invention Grant
US07678255B2 Mask and method for electrokinetic deposition and patterning process on substrates 有权
用于基体上的电动沉积和图案化工艺的掩模和方法

Mask and method for electrokinetic deposition and patterning process on substrates
Abstract:
A mask for application to a substrate to facilitate electrokinetic deposition of charged particles onto the substrate, the mask comprising a conducting layer, a dielectric layer, and mask openings. A method for applying a pattern of charged particles to a substrate comprising applying the foregoing the substrate to yield a masked substrate; immersing the masked substrate in a bath containing the charged particles; and establishing an electrical potential between the conducting layer of the mask and a counter-electrode thereby electrokinetically depositing the particles through the mask openings onto areas of the substrate exposed in the mask openings. Products made by this method.
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