Invention Grant
US07678512B2 Method of making a grayscale reticle using step-over lithography for shaping microlenses
失效
使用逐步光刻制作灰阶标线的方法，用于成型微透镜
- Patent Title: Method of making a grayscale reticle using step-over lithography for shaping microlenses
- Patent Title (中): 使用逐步光刻制作灰阶标线的方法，用于成型微透镜
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Application No.: US11657326Application Date: 2007-01-24
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Publication No.: US07678512B2Publication Date: 2010-03-16
- Inventor: Yoshi Ono , Bruce D. Ulrich , Wei Gao
- Applicant: Yoshi Ono , Bruce D. Ulrich , Wei Gao
- Applicant Address: US WA Camas
- Assignee: Sharp Laboratories of America, Inc.
- Current Assignee: Sharp Laboratories of America, Inc.
- Current Assignee Address: US WA Camas
- Agency: Law Office of Gerald Maliszewski
- Agent Gerald Maliszewski
- Main IPC: G03F1/00
- IPC: G03F1/00
Abstract:
A method of fabricating a grayscale reticle includes preparing a quartz wafer substrate; depositing a layer of SRO on the top surface of the quartz substrate; patterning and etching the SRO to form an initial microlens pattern using step-over lithography; patterning and etching the SRO to form a recessed pattern in the SRO; depositing an opaque film on the SRO; patterning and etching the opaque film; depositing and planarizing a planarizing layer; cutting the quartz wafer into rectangular pieces sized to be smaller than a selected blank reticle; bonding the a piece a to selected reticle blank to form a grayscale reticle; and using the grayscale reticle to form a microlens array on a photoimager.
Public/Granted literature
- US20080176148A1 Method of making a grayscale reticle using step-over lithography for shaping microlenses Public/Granted day:2008-07-24
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