A semiconductor spacer structure comprises in order a backgrinding tape layer, a spacer adhesive layer, a semiconductor spacer layer, an optional second spacer adhesive layer, a dicing tape layer. In a first method a spacer wafer having first and second sides, a backgrinding tape layer and a spacer adhesive layer between the first side and the backgrinding tape layer, is obtained. The second side is background and secured to a dicing tape. The backgrinding tape is removed and the resulting structure is diced to create spacer/adhesive die structures. A second method backgrinds the second side with the backgrinding tape layer at the first side. A protective cover layer is secured to the second side with a spacer adhesive layer therebetween. The backgrinding tape layer is removed and the remaining structure is secured to a dicing tape with the protective cover layer exposed. The protective cover layer is removed and the resulting structure is diced thereby creating spacer/adhesive die structures. The thickness of the second spacer adhesive layer may be selected to accommodate an uneven support surface.