Invention Grant
- Patent Title: Semiconductor device and method for manufacturing same
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US11519514Application Date: 2006-09-12
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Publication No.: US07678624B2Publication Date: 2010-03-16
- Inventor: Shunpei Yamazaki , Takeshi Fukunaga
- Applicant: Shunpei Yamazaki , Takeshi Fukunaga
- Applicant Address: JP
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP
- Agency: Cook Alex Ltd.
- Priority: JP10-071311 19980305
- Main IPC: H01L21/84
- IPC: H01L21/84

Abstract:
Disclosed is a semiconductor device having a driver circuit operable at high speed and a method for manufacturing same. An active matrix liquid crystal display device uses a polysilicon film for its TFT active layer constituting a pixel matrix circuit because of low off current characteristics. On the other hand, a TFT active layer constituting driver circuits and a signal processing circuit uses a poly silicon germanium film because of high speed operation characteristics.
Public/Granted literature
- US20070010075A1 Semiconductor device and method for manufacturing same Public/Granted day:2007-01-11
Information query
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