Invention Grant
US07678670B2 TEG removing method in manufacturing method for semiconductor chips 有权
用于半导体芯片的制造方法中的TEG去除方法

TEG removing method in manufacturing method for semiconductor chips
Abstract:
A semiconductor chip manufacturing process includes sticking a protective sheet onto a first surface of a semiconductor wafer so that the sheet comes in contact with the TEG, placing a mask on a second surface that is a surface opposite from the first surface, performing plasma etching on the second surface to remove portions corresponding to dividing regions and separate device-formation-regions into individual semiconductor chips, and removing the TEG in a state where it remains unremoved in the dividing regions and stuck to the protective sheet together with the protective sheet by peeling off the protective sheet.
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