中科微点-全球专利检索

  1. Login
  2. Sign Up
Invention Grant
US07678697B2 Substrate, device, method of manufacturing device, method of manufacturing active matrix substrate, electro-optical apparatus and electronic apparatus 失效
基板，装置，制造装置的方法，制造有源矩阵基板的方法，电光装置和电子装置

  • Patent Title: Substrate, device, method of manufacturing device, method of manufacturing active matrix substrate, electro-optical apparatus and electronic apparatus
  • Patent Title (中): 基板，装置，制造装置的方法，制造有源矩阵基板的方法，电光装置和电子装置
  • Application No.: US12005627
    Application Date: 2007-12-28
  • Publication No.: US07678697B2
    Publication Date: 2010-03-16
  • Inventor: Toshimitsu Hirai
  • Applicant: Toshimitsu Hirai
  • Applicant Address: JP Tokyo
  • Assignee: Seiko Epson Corporation
  • Current Assignee: Seiko Epson Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Oliff & Berridge, PLC
  • Priority: JP2003-131600 20030509; JP2003-131601 20030509; JP2004-115371 20040409
  • Main IPC: H01L21/44
  • IPC: H01L21/44
Substrate, device, method of manufacturing device, method of manufacturing active matrix substrate, electro-optical apparatus and electronic apparatus
Abstract:
A substrate on which a pattern is formed by a discharged functional liquid, includes a coating region coated with the functional liquid, and banks formed to enclose the coating region, wherein a difference between a contact angle of the functional liquid with respect to the coating region and a contact angle of the functional liquid with respect to the bank is above 40°.
Abstract(Chinese):

由排出的功能液体形成图案的基板包括被涂覆有功能液体的涂布区域和形成为包围涂布区域的堤，其中功能液体相对于涂布区域的接触角之间的差异 并且功能液体相对于堤岸的接触角高于40°。

Public/Granted literature
Information query
Espacenet
Patent Agency Ranking
0/0