Invention Grant
- Patent Title: Method for producing halogen-substituted benzenedimethanol
- Patent Title (中): 制备卤素取代苯二甲醇的方法
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Application No.: US11572505Application Date: 2005-08-02
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Publication No.: US07678947B2Publication Date: 2010-03-16
- Inventor: Koji Hagiya
- Applicant: Koji Hagiya
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2004-228954 20040805
- International Application: PCT/JP2005/014486 WO 20050802
- International Announcement: WO2006/013999 WO 20060209
- Main IPC: C07C33/28
- IPC: C07C33/28 ; C07C29/136

Abstract:
A method for producing a halogen-substituted benzenedimethanol represented by the formula (2): wherein X1 to X4 are the same or different and independently represent a halogen atom or the like, provided that at least one of X1 to X4 is a halogen atom, by reacting a halogen-substituted terephthalic acid diester represented by the formula (1): wherein R1 and R2 are the same or different and independently represent a C1-C20 alkyl group which may have a substitutent or substituents, and X1 to X4 is the same as defined above, with a borohydride compound in the presence of an alcohol which comprises adding the alcohol into a mixture of the halogen-substituted terephthalic acid diester represented by the formula (1), the borohydride compound and a solvent.
Public/Granted literature
- US20070213570A1 METHOD FOR PRODUCING HALOGEN-SUBSTITUTED BENZENEDIMETHANOL Public/Granted day:2007-09-13
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