Invention Grant
- Patent Title: Bipolar transistor with silicided sub-collector
- Patent Title (中): 双极晶体管,带硅化子集电极
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Application No.: US11620242Application Date: 2007-01-05
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Publication No.: US07679164B2Publication Date: 2010-03-16
- Inventor: Francois Pagette , Christian Lavoie , Anna Topol
- Applicant: Francois Pagette , Christian Lavoie , Anna Topol
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Yuanmin Cai
- Main IPC: H01L27/102
- IPC: H01L27/102

Abstract:
Embodiments of the invention provide a semiconductor device including a collector in an active region; a first and a second sub-collector, the first sub-collector being a heavily doped semiconductor material adjacent to the collector and the second sub-collector being a silicided sub-collector next to the first sub-collector; and a silicided reach-through in contact with the second sub-collector, wherein the first and second sub-collectors and the silicided reach-through provide a continuous conductive pathway for electrical charges collected by the collector from the active region. Embodiments of the invention also provide methods of fabricating the same.
Public/Granted literature
- US20080164494A1 BIPOLAR TRANSISTOR WITH SILICIDED SUB-COLLECTOR Public/Granted day:2008-07-10
Information query
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