An exposure apparatus having an element to be cooled and which exposes a substrate to patterned radiation by using the element. A reservoir houses a liquid coolant therein. A first pump disposed between the reservoir and the element supplies the coolant from the reservoir to the element. A heater disposed between the first pump and the element heats the coolant supplied from the first pump. A jacket receives the coolant from the heater and cools the element. A second pump disposed between the jacket and the reservoir supplies the coolant from the jacket to the reservoir. A cooler disposed between the second pump and the reservoir cools the coolant supplied from the second pump, and a valve is disposed between the second pump and the cooler for controlling the supply of the coolant.